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| (L) 22 nm gate-length T-gate (R) Photonic bandgap waveguide |
30th June 2010
University of Glasgow, UK
Nanoscale Plasma Processing Workshop
Presented by:
Glasgow James Watt Nanofabrication Centre & Oxford Instruments Plasma Technology
Timing: 9.30am – 4.30pm
Presentations, Discussions, Laboratory Tour and a networking lunch
This one day seminar will focus on latest innovations in Atomic Layer Deposition, Silicon and III-V Etch.
To register for this seminar, click here
Programme:
| Registration and coffee |
9:00 – 9:30 |
|
Welcome
Introduction to the Glasgow James Watt Nanofabrication Centre |
9:30-10:00 |
Prof Douglas Paul, Dept of Electrical & Electronics Engineering, University of Glasgow |
| III-V Etching – Nanoscale and low damage |
10:00 -10:30 |
Dr Ligang Deng, OIPT |
| Introduction to Kelvin Nanotechnology |
10:30-11:00 |
Brendan Casey |
| Break |
11:00-11:20 |
|
| High resolution patterning and etching |
11:20-11:50 |
Dr Alex Robinson, University of Birmingham |
| Introduction to ALD – materials and applications |
11:50-12:20 |
Chris Hodson, OIPT |
| Lunch break |
12:20-13:15 |
|
| Challenges for Atomic Layer Deposition for CMOS devices with high mobility channel materials |
13:15-13:45 |
Annelies Delabie, IMEC |
| Silicon Etch – Alternative processes |
13:45-14:15 |
Bob Gunn/Colin Welch, OIPT |
| Closing remarks and questions |
14:15-14:30 |
Prof Douglas Paul |
| Cleanroom tours |
14:30-15:30 |
Prof Douglas Paul & Dr Haiping Zhou, Dept of Electrical & Electronics Engineering, University of Glasgow |
| Networking Tea |
15:30-16:00 |
|
To register for this seminar, click here