Our 2009 workshops and seminars held in conjunction with the University of Southampton, UK; Cornell, UCSB and Lawrence Berkeley National Laboratory, CA, USA; & TUe Eindhoven, Netherlands were a great success, and we are currently planning our 2010 series.
The seminars' wide programmes will include talks by Oxford Instruments Plasma Technology (OIPT) applications & development scientists, in addition to key guest speakers and researchers from the host Universities.
For more information or to register for the seminars below click here
2010 Seminars
15-16th July 2010
Molecular Foundry, Lawrence Berkeley National Laboratory, Berkeley, CA, USA
New Frontiers in Plasma Nanopatterning
Programme:
15th July 2010 9:00am - 5:30pm
| Nanoelectronics: “More than Moore” |
Jeff Bokor |
UCB |
| Selective ALD |
Pat Bennett |
UCB |
| Recent advancements in (plasma-assisted) ALD: from c-Si photovoltaics to direct-write patterning |
Dr Erwin Kessels |
TUe, NL |
| Mask Etching - Inorganic resists |
Doug Keszler |
OSU |
| Correlation between surface chemistry and ion energy dependence of the etch yield in multicomponent oxides etching |
Joelle Margot |
INRS |
| Pt Plasma vs Thermal and Latest developments |
Chris Hodson |
OIPT |
| Plasma diagnostics link to ‘on wafer’ performance |
Ying Wu |
OIPT |
| Patterning of Graphene |
Xiaogan Liang |
LBNL |
|
General intro to the Molecular Foundry & Group tours of the Nanofab and Foundry |
David Bunzow |
LBNL |
|
Wine and Cheese Reception:
A time to chat with the speakers!
Process applications desk on hand Poster session |
|
|
16th July 2010 9:00am - 12:30pm
| Intro to Nanofabrication Facility and Oxford Instruments |
LBNL & OIPT |
|
| Note: Workshops and tours below will run concurrently to allow participants to attend all sessions |
|
|
| Cleanroom tours in groups |
LBNL Staff |
|
| Intro to ALD/PECVD |
Chris Hodson |
OIPT |
| Intro to Plasma Diagnostics |
Steve Shannon
& OIPT |
NCSU |
| Intro to Nanofabrication & Etching |
Andy Goodyear
Deirdre Olynick |
OIPT
LBNL |
To register for this seminar click here
*********************************************************
27-28th September 2010
University of Freiburg, Germany
Workshop on Dry Processing for Nanoelectronics and Micromechanics
Programme:
27th September 2010
| Mass spectrometry for ALD |
Sebastian Gutsch |
IMTEK |
| SIMS for ion beam etching |
Sebastien Pochon |
OIPT |
| Review of plasma sources |
Andy Goodyear |
OIPT |
| Parallel Plate-13.56 MHz, 81 MHz and ICP PECVD |
Damian Pysch |
FhG ISE |
| Plasma and mechanical cleaning of PECVD Systems |
Dr Owain Thomas |
OIPT |
| Controlled ZnO nanowire growth in the Nanofab700 |
Johannes Ruhhammer |
IMTEK |
| Troubleshooting in ALD |
Saleem Shabbir |
OIPT |
| Si Etching review |
Colin Welch |
OIPT |
| Poster session, Lab tour & CONFERENCE DINNER |
|
|
28th September 2010
| ALD Review |
Chris Hodson |
OIPT |
| Charging effect simulation model, embedded in the integrated plasma processing simulation framework, used for modelling of the notching effect |
V Ishchuk, B Volland, M Hauguth, I Rangelow |
Uni Ilmenau |
| Endpoint Detection and in situ analysis for plasma systems |
Andy Goodyear |
OIPT |
| Optimized PECVD SiOx layers for Si nanocrystal applications |
Andreas Hartel |
IMTEK |
| The use of liners for dry etching and deposition |
Colin Welch |
OIPT |
| The "bias" in dry etching |
Andy Goodyear |
OIPT |
To register for this seminar click here