ZnO ALD (thermal only) - Zinc Oxide Atomic Layer Deposition

OpAL - Open Load ALD Tool
OpAL for Atomic Layer Deposition

Process Specification
Zinc Oxide thermal ALD using the OpALTM ALD System

Wafer Sizes 100mm, 150mm, 200mm
Refractive Index  1.90 - 1.95

  • Benefits 
  • Applications 
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Process Benefits

  • True self-limiting ALD behaviour
  • Highly repeatable process
  • Highly conformal deposition

Applications

  • Optoelectronics
  • Transparent conductive oxide (TCO)
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Related Products

FlexAL
ALD Tool for ZnO Deposition
OpAL
ALD system for Zinc Oxide Deposition

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SiGe Deposition - Silicon Germanium Deposition
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